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Processing of finely dispersed zirconium silicate powder in a high-frequency induction plasmatron jet
被引：0
作者：
I. N. Novikov
A. M. Kruchinin
机构：
[1] Tekhnokeramika Co.,SIGNAL Device Plant
来源：
Technical Physics Letters
|
2014年
/
40卷
关键词：
Technical Physic Letter;
Discharge Chamber;
High Frequency Discharge;
High Frequency Generator;
High Frequency Plasma;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The physical peculiarities and prospects of using high-frequency plasma discharge for processing of finely dispersed zirconium silicate powder are considered. A high-frequency induction plasmatron setup is described.
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页码：920 / 922
页数：2
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