The design and construction of a compact high-voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma immersion ion implantation (PIII) are described. The generator was built on a circuit category of Pulse Forming Network (PFN), consisting of nine LC sections with L = 270 μH and C = 2.5 nF.
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Chaltakov I.V.(1988)undefined J. Physics E; Sci. Instruments 21 663-undefined