Growth Simulation and Structure Analysis of Obliquely Deposited Thin Films

被引:0
作者
B. A. Belyaev
A. V. Izotov
P. N. Solovev
机构
[1] L. V. Kirensky Institute of Physics of the Siberian Branch of the Russian Academy of Sciences,
[2] Siberian Federal University,undefined
[3] Siberian State Aerospace University Named after Academician M. F. Reshetnev,undefined
来源
Russian Physics Journal | 2016年 / 59卷
关键词
oblique angle deposition; simulation of film growth; Monte Carlo method;
D O I
暂无
中图分类号
学科分类号
摘要
Based on the Monte Carlo method, a model of growth of thin films prepared by oblique angle deposition of particles is constructed. The morphology of structures synthesized by simulation is analyzed. To study the character of distribution of microstructural elements (columns) in the film plane, the autocorrelation function of the microstructure and the fast Fourier transform are used. It is shown that with increasing angle of particle incidence, the film density monotonically decreases; in this case, anisotropy arises and monotonically increases in the cross sections of columns, and the anisotropy of distribution of columns in the substrate plane also increases.
引用
收藏
页码:301 / 307
页数:6
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