Thermally Induced Deep Centers in Silicon Doped with Europium or Lanthanum

被引:0
作者
Kh. S. Daliev
Sh. B. Utamuradova
I. Kh. Khamidzhonov
A. Zh. Akbarov
I. K. Mirzairova
Zh. Akimova
机构
[1] Ulughbek State University,
来源
Inorganic Materials | 2001年 / 37卷
关键词
Oxygen; Spectroscopy; Silicon; Europium; Heat Treatment;
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学科分类号
摘要
Melt-grown silicon crystals doped with europium or lanthanum were studied by capacitance spectroscopy and infrared absorption spectrophotometry. The Eu and La in the as-grown crystals were demonstrated to be electrically inactive. Annealing in the temperature range 900–1200°C produced a few deep levels in the band gap of both n-Si〈Eu〉 and n-Si〈La〉. These levels are likely related to the activation of the Eu and La impurities: Eu seems to be responsible for the levels at Ec– 0.40 eV and Ec– 0.46 eV, and La for the level at Ev+ 0.32 eV. Infrared absorption measurements indicate that heat treatment increases the concentration of optically active (interstitial) oxygen in the crystals by 15–20%.
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页码:436 / 438
页数:2
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