Post-deposition processes for nanostructures formed by electron beam induced deposition with Pt(PF3)4 precursor

Electron beam induced deposition was performed using a Pt(PF3)4 precursor gas. Self-standing nanowires were produced on the edge of a molybdenum film, followed by two post-deposition processes; electron beam irradiation at room temperature and heating at about 400 K in vacuum. The as-deposited nanowires were composed of an amorphous phase, of which the dominant composition was platinum but containing a small amount of phosphorus impurity. After irradiating with a 300 keV electron beam, the amorphous nanowires were transformed to crystalline ones. By heating, the as-deposited nanowires became single-crystal platinum with a large grain size and the phosphorus content disappeared.