Cr2O3 Doping Effect on Silica Glass Cooling Rate

被引:0
作者
Mikhail A. Eronyan
Peter S. Parfenov
Alexey Yu. Kulesh
Igor K. Meshkovskiy
Alexander A. Untilov
机构
[1] St. Petersburg National Research University of Information Technologies,
[2] Mechanics and Optics (ITMO University),undefined
[3] JSC Concern Central Research Institute Elektropribor,undefined
来源
Silicon | 2023年 / 15卷
关键词
Silica glass; Heat exchange; Radiation; Cooling; Roughness; Strength;
D O I
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中图分类号
学科分类号
摘要
In this paper we present the results on the effect of the SiO2 melt cooling rate on the morphology of its surface. The method of atomic force microscopy explores a surface roughness of the silica glass cooled at different rates after its heating up to more than 2100 °C. The study compares three modes of cooling glass rods with a diameter of 14 mm: convective heat exchange with the surrounding air, quenching with dropping the sample into a vessel with water, and radiation of silica glass doped with 0.1 wt% Cr2O3. The surface roughness of silica glass in the second and third modes of cooling was significantly less than in the conditions of convective heat exchange. Doping the silica glass with Cr2O3 increases the heat exchange coefficient by 2 times and decreases the surface roughness. The results of the research can contribute to improving the mechanical and optical properties of silica glass light guides.
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页码:3479 / 3483
页数:4
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