Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering

被引:0
|
作者
Dong Hyun Hwang
Jung Hoon Ahn
Kwun Nam Hui
Kwan San Hui
Young Guk Son
机构
[1] Pusan National University,School of Materials Science and Engineering
[2] City University of Hong Kong,Department of Systems Engineering and Engineering Management
来源
Nanoscale Research Letters | / 7卷
关键词
ZnS film; RF magnetron sputtering; solar cell; Cd-free buffer layer;
D O I
暂无
中图分类号
学科分类号
摘要
Zinc sulfide [ZnS] thin films were deposited on glass substrates using radio frequency magnetron sputtering. The substrate temperature was varied in the range of 100°C to 400°C. The structural and optical properties of ZnS thin films were characterized with X-ray diffraction [XRD], field emission scanning electron microscopy [FESEM], energy dispersive analysis of X-rays and UV-visible transmission spectra. The XRD analyses indicate that ZnS films have zinc blende structures with (111) preferential orientation, whereas the diffraction patterns sharpen with the increase in substrate temperatures. The FESEM data also reveal that the films have nano-size grains with a grain size of approximately 69 nm. The films grown at 350°C exhibit a relatively high transmittance of 80% in the visible region, with an energy band gap of 3.79 eV. These results show that ZnS films are suitable for use as the buffer layer of the Cu(In, Ga)Se2 solar cells.
引用
收藏
相关论文
共 50 条
  • [11] Study of the structural and optical properties of GaPN thin films grown by magnetron RF sputtering
    Pulzara-Mora, A
    Meléndez-Lira, M
    Jiménez-Sandoval, S
    Lopez-Lopez, M
    VACUUM, 2006, 80 (05) : 468 - 474
  • [12] Structural and optical properties of yttrium trioxide thin films prepared by RF magnetron sputtering
    Yan, F.
    Liu, Z. T.
    Liu, W. T.
    VACUUM, 2011, 86 (01) : 72 - 77
  • [14] Optical characterization of ZnO thin films deposited by RF magnetron sputtering method
    Ning Tang
    JinLiang Wang
    HengXing Xu
    HongYong Peng
    Chao Fan
    Science in China Series E: Technological Sciences, 2009, 52 : 2200 - 2203
  • [15] Study of the surface chemistry, surface morphology, optical, and structural properties of InGaN thin films deposited by RF magnetron sputtering
    Granada-Ramirez, D. A.
    Pulzara-Mora, A.
    Pulzara-Mora, C. A.
    Pardo-Sierra, A.
    Cardona-Bedoya, A.
    Perez-Gonzalez, M.
    Tomas, S. A.
    Gallardo-Hernandez, S.
    Mendoza-Alvarez, J. G.
    APPLIED SURFACE SCIENCE, 2022, 586
  • [16] Optical characterization of ZnO thin films deposited by RF magnetron sputtering method
    Tang Ning
    Wang JinLiang
    Xu HengXing
    Peng HongYong
    Fan Chao
    SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES, 2009, 52 (08): : 2200 - 2203
  • [17] Structural properties of limn2o4 thin films deposited by rf magnetron sputtering
    Bae, Ji Hwan
    Hwang, Dong Hyun
    Cho, Shin Ho
    Kim, Jung Dae
    Son, Young Guk
    JOURNAL OF CERAMIC PROCESSING RESEARCH, 2016, 17 (04): : 356 - 359
  • [18] Properties of TiO2 thin films deposited by RF magnetron sputtering
    Sima, C.
    Waldhauser, W.
    Lackner, J.
    Kahn, M.
    Nicolae, I.
    Viespe, C.
    Grigoriu, C.
    Manea, A.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2007, 9 (05): : 1446 - 1449
  • [19] Effect of post annealing on structural, optical and dielectric properties of MgTiO3 thin films deposited by RF magnetron sputtering
    Kumar, T. Santhosh
    Bhuyan, R. K.
    Pamu, D.
    APPLIED SURFACE SCIENCE, 2013, 264 : 184 - 190
  • [20] Preparation and properties of GeC thin films deposited by reactive RF magnetron sputtering
    Li Yang-Ping
    Liu Zheng-Tang
    Liu Wen-Ting
    Yan Feng
    Chen Jing
    ACTA PHYSICA SINICA, 2008, 57 (10) : 6587 - 6592