Influence of the Si(111)-7×7 surface reconstruction on the diffusion of strontium atoms

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作者
R. A. Zhachuk
S. A. Teys
B. Z. Olshanetsky
机构
[1] Siberian Branch of the Russian Academy of Sciences,Rzhanov Institute of Semiconductor Physics
关键词
Scanning Tunnel Microscope; Scanning Tunnel Microscope Image; Half Cell; Strontium Atom; Half Unit Cell;
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摘要
The diffusion of strontium atoms on the Si(111) surface at room temperature has been investigated using scanning tunnel microscopy and simulation carried out in terms of the density functional theory and the Monte Carlo method. It has been found that the reconstruction of a clean silicon surface with a 7 × 7 structure has a profound effect on the diffusion process. The average velocity of motion of a strontium atom in a unit cell of the 7 × 7 structure has been calculated. The main diffusion paths of a strontium atom and the corresponding activation energies have been determined. It has been demonstrated that the formation of scanning tunnel microscope images of the Si(111)-7 × 7 surface with adsorbed strontium atoms is significantly affected by the shift of the electron density from the strontium atom to the nearest neighbor silicon adatoms in the 7 × 7 structure.
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页码:972 / 982
页数:10
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