Performance of Indium Gallium Zinc Oxide Thin-Film Transistors in Saline Solution

被引:0
作者
S. Gupta
S. P. Lacour
机构
[1] École Polytechnique Fédérale de Lausanne (EPFL),Laboratory for Soft Bioelectronics Interface (LSBI), School of Engineering and Centre for Neuroprosthetics
来源
Journal of Electronic Materials | 2016年 / 45卷
关键词
IGZO; encapsulation; phosphonate buffer solution; flexible substrate;
D O I
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中图分类号
学科分类号
摘要
Transistors are often envisioned as alternative transducing devices to microelectrodes to communicate with the nervous system. Independently of the selected technology, the transistors should have reliable performance when exposed to physiological conditions (37°C, 5% CO2). Here, we report on the reliable performance of parylene encapsulated indium gallium zinc oxide (IGZO) based thin-film transistors (TFTs) after prolonged exposure to phosphate buffer saline solution in an incubator. The encapsulated IGZO TFTs (W/L = 500 μm/20 μm) have an ON/OFF current ratio of 107 and field effect mobility of 8.05 ± 0.78 cm2/Vs. The transistors operate within 4 V; their threshold voltages and subthreshold slope are ~1.9 V and 200 mV/decade, respectively. After weeks immersed in saline solution and at 37°C, we did not observe any significant deterioration in the transistors’ performance. The long-term stability of IGZO transistors at physiological conditions is a promising result in the direction of metal oxide bioelectronics.
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页码:3192 / 3194
页数:2
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