Implantation of Silicon Ions into Sapphire: Low Doses

被引：0

作者：

N. E. Belova

S. G. Shemardov

S. S. Fanchenko

E. A. Golovkova

O. A. Kondratev

机构：

[1] National Research Center “Kurchatov Institute”,

来源：

Semiconductors | 2020年 / 54卷

关键词：

ion implantation; sapphire; nanoparticles; precipitates; X-ray diffraction analysis; reflectometry;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：912 / 915

页数：3

共 52 条

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