Structural and electrical properties of polycrystalline Bi(Fe0.6Mn0.4)O3 thin films

A 40% Mn-substituted BiFeO3 (BFMO) thin film was deposited on a Pt(111)/Ti/SiO2/Si(100) substrate by using a pulsed laser deposition method. The coexistence of rhombohedral and orthorhombic structures in the BFMO thin film was confirmed by using X-ray diffraction and Raman spectra investigation. The leakage current density of the BFMO thin film was larger than that of a pure polycrystalline BiFeO3 (BFO) thin film. In order to understand the leakage current behaviors, was investigated the leakage current mechanisms. The leakage current mechanism of the BFO thin film was found to be space-charge-limited conduction (SCLC), followed by trap-filled conduction causal by the increasing electric field strength. On the other hand, trap-filled conduction was not observed in the BFMO thin film. A leaky ferroelectric hysteresis loop was observed in the BFMO thin film, but not in the BFO thin film.