Modeling the deflection of relativistic electrons in a bent silicon crystal

被引:0
作者
V. P. Koshcheev
Yu. N. Shtanov
D. A. Morgun
T. A. Panina
机构
[1] Strela Branch of the National Research University MAI (Moscow Aviation Institute),Surgut Oil and Gas Institute
[2] Branch of Tyumen State Oil and Gas University,undefined
[3] Surgut State University,undefined
来源
Technical Physics Letters | 2015年 / 41卷
关键词
Technical Physic Letter; Relativistic Electron; Atomic Diffusion; Atomic Chain; Channeling;
D O I
暂无
中图分类号
学科分类号
摘要
The deflection of electrons with energies 855 MeV and 6.3 GeV in planar (111) channels of a bent silicon crystal has been numerically simulated using a TROPICS computer code with atomic diffusion coefficient constructed in the Doyle–Turner approximation of the isolated atom potential. It is established that the atomic diffusion coefficient tends to a minimum value in the region of maximum nuclear density of atomic chain, where the Kitagawa–Ohtsuki diffusion coefficient reaches a maximum value.
引用
收藏
页码:946 / 949
页数:3
相关论文
共 16 条
[1]  
Mazzolari A.(2014)undefined Phys. Rev. Lett. 112 135503-undefined
[2]  
Wienands U.(2015)undefined Phys. Rev. Lett. 114 074801-undefined
[3]  
Kitagawa M.(1973)undefined Phys. Rev. B 8 3117-undefined
[4]  
Ohtsuki Y. H.(1965)undefined Mat.-Fys. Medd. Dan. Vid. Selsk. 34 14-undefined
[5]  
Lindhard J.(1997)undefined Russ. Phys. J. 40 736-undefined
[6]  
Koshcheev V. P.(2009)undefined Bull. Russ. Acad. Sci.: Phys. 73 1491-undefined
[7]  
Koshcheev V. P.(2013)undefined Tech. Phys. Lett. 39 924-undefined
[8]  
Morgun D. A.(1964)undefined SIAM Rev. 6 260-undefined
[9]  
Panina T. A.(1968)undefined Acta Crystallogr. A 24 390-undefined
[10]  
Koshcheev V. P.(undefined)undefined undefined undefined undefined-undefined