Numerical Study of the Thresholds of Sputtering of Metals during Bombardment with Low-Energy Ions

被引：1

作者：

Evstifeev V.V. ^{[1
]}

Kostina N.V. ^{[1
]}

机构：

[1] Penza State University, Penza

来源：

Bulletin of the Russian Academy of Sciences: Physics | 2020年 / 84卷 / 06期

关键词：

D O I：

10.3103/S1062873820060118

中图分类号：

学科分类号：

摘要：

Abstract: The transfer of energy from bombarding K+ and Ar+ions (E0 = 10–100 eV) to vanadium atoms is studied via molecular dynamics using the Vs potential. The threshold energy of vanadium sputtering is determined, and a numerical way of determining the thresholds of sputtering for solids is proposed. © 2020, Allerton Press, Inc.

引用

页码：720 / 726

页数：6

共 7 条

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[2] Evstifeev V.V., Kostina N.V., Bull. Russ. Acad. Sci.: Phys., 82, (2018)
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[5] Evstifeev V.V., Mnogochastichnye vzaimodeistviya pri rasseyanii medlennykh ionov poverkhnost’yu metallov, Pensa: Penzensk. Gos. Univ., (2009)
[6] Harrison D.E., Magnuson G.D., Phys. Rev., 122, (1961)
[7] Stuart R.V., Wehner G.K., J. Appl. Phys., 33, (1962)

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