Planar Triode for Vacuum Microelectronics

被引:0
作者
Rekhviashvili S.S. [1 ]
Gaev D.S. [2 ]
机构
[1] Institute of Applied Mathematics and Automation, Kabardino-Balkaria Scientific Center, Russian Academy of Sciences, Nalchik, 360000, Kabardino-Balkar Republic
[2] Kabardino-Balkarian State University, Nalchik, 360004, Kabardino-Balkar Republic
关键词
cutoff voltage; electron emission; planar vacuum triode; vacuum microelectronics;
D O I
10.1134/S1063739720020079
中图分类号
学科分类号
摘要
Abstract: The article studies a triode for vacuum microelectronics with horizontal geometry (planar triode). A simple theoretical model of the device is proposed and the minimum cutoff voltage is calculated. Experiments are carried out on the fundamental model of the device, which qualitatively confirm the main theoretical conclusions. © 2020, Pleiades Publishing, Ltd.
引用
收藏
页码:210 / 213
页数:3
相关论文
共 11 条
[1]  
Brodie I., Spindt C.A., Vacuum microelectronics, Adv. Electron.Electron Phys., 83, pp. 1-106, (1992)
[2]  
Brodie I., Schwoebel P.R., Vacuum microelectronic devices, Proc. IEEE, 82, pp. 1006-1034, (1994)
[3]  
Schwoebel P.R., Brodie I., Surface-science aspects of vacuum microelectronics, J. Vac. Technol. B, 13, pp. 1391-1410, (1995)
[4]  
Busta H.H., Vacuum microelectronics, J. Micromech. Microeng., 2, pp. 43-74, (1992)
[5]  
(2001)
[6]  
Tatarenko N.I., Kravchenko V.M., Avtoemissionnye Nanostruktury I Pribory Na Ikh Osnove (Field Emission Nanostructures and Devices Based on Them, (2006)
[7]  
Smolin V.K., Shobolov E.L., Vacuum microelectronics—a promising way for development of ECB for operation in extreme conditions, Nano-Mikrosist, Tekh., 18, pp. 227-234, (2016)
[8]  
Subramanian K., Kang W.P., Davidson J.L., Hofmeister W.H., Choi B.K., Howell M., Nanodiamond planar lateral field emission diode, Diamond Relat. Mater., 14, pp. 2099-2104, (2005)
[9]  
Song X., Gao J., Fu Q., Xu J., Zhao Q., Yu D., Novel planar field emission of ultra-thin individual carbon nanotubes, (2009)
[10]  
Han J.-W., Oh J.S., Meyyappan M., Vacuum nanoelectronics: Back to the future? Gate insulated nanoscale vacuum channel transistor, Appl. Phys. Lett., 100, pp. 213505-213511, (2012)