Chromium as an antidiffusion interlayer in higher manganese silicide-nickel contacts

被引：0

作者：

L. I. Petrova

L. D. Dudkin

V. S. Khlomov

M. I. Fedorov

V. K. Zaitsev

F. Yu. Solomkin

机构：

[1] Russian Academy of Sciences,Baikov Institute of Metallurgy

[2] Russian Academy of Sciences,Ioffe Physicotechnical Institute

来源：

Technical Physics | 2000年 / 45卷

关键词：

Nickel; Chromium; Manganese; Electrical Property; Chromium Layer;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

The interaction of higher manganese silicide (MnSi1.71–1.75) with nickel and chromium was investigated. A chromium layer was shown to inhibit nickel diffusion into silicide more than four times. The use of the chromium layer made it possible to improve the mechanical and electrical properties of silicide-nickel contacts.

引用

页码：641 / 643

页数：2

共 7 条

[1]

Fedorov M. I.(1997)undefined Pis’ma Zh. Tekh. Fiz. 23 64-undefined

[2]

Zaitsev V. K.(1995)undefined Neorg. Mater. 31 1216-undefined

[3]

Solomkin F. Yu.(1967)undefined Fiz. Metal. Metalloved. 24 442-undefined

[4]

Petrova L. I.(undefined)undefined undefined undefined undefined-undefined

[5]

Dudkin L. D.(undefined)undefined undefined undefined undefined-undefined

[6]

Khlomov V. S.(undefined)undefined undefined undefined undefined-undefined

[7]

Ugaste Yu. É.(undefined)undefined undefined undefined undefined-undefined

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