An implanter with a mixed ion beam for modifying the properties of the surface of construction materials

An accelerator with the energy of single-charged ions to 70 keV and the total current to 100 mA to modify the properties of construction materials is designed. A two-step universal ion source based on low-pressure discharge with the sputtering of the targets by plasma makes it possible to obtain gas and dropless mixed beams of charged particles with a controlled ratio of Me+/G+ ions in the accelerator, which works like a bipolar diode.