Effect of the Structural Properties on the Electrical Resistivity of the Al/Ag Thin Films during the Solid-State Reaction

被引：0

作者：

R. R. Altunin

E. T. Moiseenko

S. M. Zharkov

机构：

[1] Siberian Federal University,

[2] Kirensky Institute of Physics,undefined

[3] Krasnoyarsk Scientific Center,undefined

[4] Siberian Branch,undefined

[5] Russian Academy of Sciences,undefined

来源：

Physics of the Solid State | 2020年 / 62卷

关键词：

thin films; phase formation; Al/Ag; solid-state reaction; electron diffraction; resistivity;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：708 / 713

页数：5

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