A simulation investigation on elliptical vibration cutting of single-crystal silicon

被引:0
作者
Changlin Liu
Jianguo Zhang
Junjie Zhang
Xiao Chen
Junfeng Xiao
Jianfeng Xu
机构
[1] Huazhong University of Science and Technology,School of Mechanical Science & Engineering
[2] Harbin Institute of Technology,Center for Precision Engineering
来源
The International Journal of Advanced Manufacturing Technology | 2020年 / 108卷
关键词
Molecular dynamics simulation; Elliptical vibration cutting; Single-crystal silicon; Workpiece integrity;
D O I
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中图分类号
学科分类号
摘要
In recent years, elliptical vibration cutting (EVC) has been proven as a promising technique to improve the cutting performance of brittle materials like silicon. However, the influence of vibration parameters on the machined surface quality has not been explored clearly. In this paper, molecular dynamics simulation was carried out to explore the machinable mechanism of silicon by EVC. Firstly, the difference in material removal performance between ordinary cutting (OC) and EVC was discussed. Then, the influence of two critical parameters in EVC, i.e., the vibration amplitude in the depth of cut (DOC) direction and the nominal DOC, on the machined surface quality was explored in detail. The simulation results demonstrate that the vibration amplitude in the DOC direction has a significant influence on the compressive stress and tensile stress distribution, which affects the phase transition and chip pulling-up motion in the EVC process. Based on the simulation results and previous experimental achievements, the high-quality surface can be obtained when the amplitude ratio in the nominal cutting/DOC direction is about 3.5. Furthermore, when the nominal DOC is increased, although the variation of tensile stress is quite small, the increased chip pulling-up distance is responsible for brittle fracture on the machined surface.
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页码:2231 / 2243
页数:12
相关论文
共 182 条
[1]  
Zong WJ(2008)XPS analysis of the groove wearing marks on flank face of diamond tool in nanometric cutting of silicon wafer Int J Mach Tool Manu 48 1678-1687
[2]  
Sun T(2015)Experimental work on micro laser-assisted diamond turning of silicon (111) J Manuf Process 19 125-128
[3]  
Li D(2010)Ultra-precision grinding CIRP Ann 59 652-671
[4]  
Cheng K(2011)Nanogrinding of multi-layered thin film amorphous Si solar panels Int J Mach Tools Manuf 51 797-805
[5]  
Liang YC(2015)A review of surface roughness generation in ultra-precision machining Int J Mach Tool Manu 91 76-95
[6]  
Mohammadi H(2015)Diamond machining of silicon: a review of advances in molecular dynamics simulation Int J Mach Tools Manuf 88 131-164
[7]  
Ravindra D(2005)Modelling and experimental investigation on nanometric cutting of monocrystalline silicon Int J Mach Tools Manuf 45 1681-1686
[8]  
Kode SK(2007)A study on mechanism of nano-cutting single crystal silicon J Mater Process Technol 184 407-410
[9]  
Patten JA(2009)Fundamental investigation of subsurface damage in single crystalline silicon caused by diamond machining Precis Eng 33 378-386
[10]  
Brinksmeier E(2012)Crystallographic effect on subsurface damage formation in silicon microcutting CIRP Ann 61 131-134