Dc plasma-enhanced chemical vapour deposition growth of carbon nanotubes and nanofibres: in situ spectroscopy and plasma current dependence

被引:0
|
作者
M. Jönsson
O.A. Nerushev
E.E.B. Campbell
机构
[1] Göteborg University,Department of Physics
来源
Applied Physics A | 2007年 / 88卷
关键词
Plasma Current; Vibrational Temperature; Multiwalled Nanotubes; Swan Band; Graphite Basal Plane;
D O I
暂无
中图分类号
学科分类号
摘要
Dc plasma-enhanced CVD growth of nanotubes and nanofibres is studied as a function of plasma power (3–40 W). The dependence of the nanotube/nanofibre morphology for growth on thin iron films and lithographically prepared individual nickel dots is investigated. In both cases, large differences in the morphology of the carbon nanostructures are observed as the plasma power is changed. In situ optical emission spectroscopy is used to obtain insight into the important parameters affecting the growth. The best growth results are found for intermediate plasma powers (15 W).
引用
收藏
页码:261 / 267
页数:6
相关论文
共 50 条
  • [41] Spatially Resolved In Situ Diagnostics for Plasma-Enhanced Chemical Vapor Deposition Carbon Film Growth
    Ismagilov, Rinat R.
    Zolotukhin, Aleksey A.
    Shvets, Petr V.
    Obraztsov, Alexander N.
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2012, 7 (01) : 90 - 94
  • [42] Plasma-enhanced chemical vapour deposition of amorphous Se films
    Nagels, P.
    Sleeckx, E.
    Callaerts, R.
    Journal De Physique, 1995, 5 (06): : 5 - 1109
  • [43] The Chemical and Morphological Properties of Boron–Carbon Alloys Grown by Plasma-Enhanced Chemical Vapour Deposition
    D. Zhang
    D. N. Mcilroy
    W. L. O'Brien
    G. De Stasio
    Journal of Materials Science, 1998, 33 : 4911 - 4915
  • [44] Preparation of carbon nanotubes and nanoparticles by microwave plasma-enhanced chemical vapor deposition
    Wang, XZ
    Hu, Z
    Chen, X
    Chen, Y
    SCRIPTA MATERIALIA, 2001, 44 (8-9) : 1567 - 1570
  • [45] Role of carbon atoms in plasma-enhanced chemical vapor deposition for carbon nanotubes synthesis
    Bratescu, M. A.
    Suda, Y.
    Sakai, Y.
    Saito, N.
    Takai, O.
    THIN SOLID FILMS, 2006, 515 (04) : 1314 - 1319
  • [46] Synthesis of carbon nanotubes on metal substrates by plasma-enhanced chemical vapor deposition
    Kim, HS
    Park, SY
    Yang, JH
    Park, CY
    ON THE CONVERGENCE OF BIO-INFORMATION-, ENVIRONMENTAL-, ENERGY-, SPACE- AND NANO-TECHNOLOGIES, PTS 1 AND 2, 2005, 277-279 : 950 - 955
  • [47] Plasma-enhanced chemical vapor deposition carbon nanotubes for ethanol gas sensors
    Hu, Chia-Te
    Liu, Chun-Kuo
    Huang, Meng-Wen
    Syue, Sen-Hong
    Wu, Jyh-Ming
    Chang, Yee-shyi
    Yeh, Jien-W.
    Shih, Han-C.
    DIAMOND AND RELATED MATERIALS, 2009, 18 (2-3) : 472 - 477
  • [49] Plasma enhanced chemical vapour deposition growth and physical properties of single-walled carbon nanotubes
    Khan, M. A. Majeed
    Khan, Wasi
    Kumar, Avshish
    Alhazaa, Abdulaziz N.
    MATERIALS LETTERS, 2018, 219 : 269 - 272
  • [50] Limitations to homoepitaxial silicon growth in plasma-enhanced chemical vapour deposition at low temperatures
    Houben, L
    Luysberg, M
    Carius, R
    Hapke, P
    Finger, F
    Wagner, H
    MICROSCOPY OF SEMICONDUCTING MATERIALS 1999, PROCEEDINGS, 1999, (164): : 211 - 214