Simulated growth of GaAs nanowires: Catalytic and self-catalyzed growth

被引:0
作者
M. V. Knyazeva
A. G. Nastovjak
I. G. Neizvestny
N. L. Shwartz
机构
[1] Russian Academy of Sciences,Rzhanov Institute of Semiconductor Physics, Siberian Branch
[2] Novosibirsk State Technical University,undefined
来源
Semiconductors | 2015年 / 49卷
关键词
Arsenic; GaAs; Gallium; Monte Carlo; Flow Rate Ratio;
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中图分类号
学科分类号
摘要
The kinetic lattice Monte Carlo model of GaAs nanowire growth by the vapor-liquid-crystal mechanism is suggested. The catalytic and self-catalyzed growth of nanowires on the GaAs (111)B surface is simulated. The dependence of the morphology of the growing nanowires on the growth parameters is demonstrated. Upon self-catalyzed growth with gallium drops serving as the growth catalyst, the growth rate of the nanowires linearly depends on the arsenic flow in a wide range of arsenic flow rates. The decreasing dependence of the self-catalyzed growth rate of the nanowires on the initial gallium drop diameter is less steep, and the optimal growth temperature is higher than that for catalytic growth. It is shown that self-catalyzed growth is more sensitive to the ratio between the gallium and arsenic flow rates than catalytic growth.
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页码:60 / 68
页数:8
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