Polishing of Precision Surfaces of Optoelectronic Device Elements Made of Glass, Sitall, and Optical and Semiconductor Crystals: A Review

[1] Sivanandini M.(2013)Chemical mechanical polishing by colloidal silica slurry Int. J. Eng. Res. Appl 3 1337-1345

[2] Dhami S.S.(2013)Scratch formation and its mechanism in chemical mechanical planarization (CMP) Friction 1 279-305

[3] Pabla B.S.(2012)Material removal by chemical mechanical polishing—a review Int. J. Adv. Res. Technol 1 1-8

[4] Kwon T.-Y.(2010)On the chemo-mechanical polishing for nano-scale surface finish of brittle wafers Recent Pat. Nanotechnol 4 70-77

[5] Ramachandran M.(2018)Review of nanophotonics approaches using nanostructures and nanofabrication for III-nitrides ultraviolet-photonic devices J. Nanophoton 12 043508-154

[6] Park J.-G.(2013)Current status and future prospects of GaN substrates for green devices Sens. Mater 25 141-1984

[7] Sivanandini M.(2016)Mechanism and simulation of removal rate and surface roughness during optical polishing of glasses J. Am. Ceram. Soc 99 1974-96

[8] Dhami S.S.(2016)Investigation of polishing pads impregnated with Fe and Al Appl. Sci 6 89-1150

[9] Pabla B.S.(2014)O Part J 228 1144-91

[10] Wang Y.G.(2015) particle for single-crystal silicon carbide wafers Appl. Surf. Sci 338 85-1727

[1] Sivanandini M.(2013)Chemical mechanical polishing by colloidal silica slurry Int. J. Eng. Res. Appl 3 1337-1345

[2] Dhami S.S.(2013)Scratch formation and its mechanism in chemical mechanical planarization (CMP) Friction 1 279-305

[3] Pabla B.S.(2012)Material removal by chemical mechanical polishing—a review Int. J. Adv. Res. Technol 1 1-8

[4] Kwon T.-Y.(2010)On the chemo-mechanical polishing for nano-scale surface finish of brittle wafers Recent Pat. Nanotechnol 4 70-77

[5] Ramachandran M.(2018)Review of nanophotonics approaches using nanostructures and nanofabrication for III-nitrides ultraviolet-photonic devices J. Nanophoton 12 043508-154

[6] Park J.-G.(2013)Current status and future prospects of GaN substrates for green devices Sens. Mater 25 141-1984

[7] Sivanandini M.(2016)Mechanism and simulation of removal rate and surface roughness during optical polishing of glasses J. Am. Ceram. Soc 99 1974-96

[8] Dhami S.S.(2016)Investigation of polishing pads impregnated with Fe and Al Appl. Sci 6 89-1150

[9] Pabla B.S.(2014)O Part J 228 1144-91

[10] Wang Y.G.(2015) particle for single-crystal silicon carbide wafers Appl. Surf. Sci 338 85-1727