Numerical investigation of thermal and residual stress of sapphire during c-axis vertical Bridgman growth process considering the solidification history effect

被引:0
作者
Ji Hoon Hwang
Young Cheol Lee
Wook Jin Lee
机构
[1] LG electronics,Materials & Production Engineering Research Institute
[2] Korea Institute of Industrial Technology,Dongnam Regional Division
来源
Metals and Materials International | 2018年 / 24卷
关键词
bridgman technique; computer simulation; crystal growth; oxide; light emitting diodes;
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学科分类号
摘要
Sapphire single crystals have been highlighted for epitaxial of gallium nitride films in high-power laser and light emitting diode industries. In this study, the evolution of thermally induced stress in sapphire during the vertical Bridgman crystal growth process was investigated using a finite element model that simplified the real Bridgman process. A vertical Bridgman process of cylindrical sapphire crystal with a diameter of 50 mm was considered for the model. The solidification history effect during the growth was modeled by the quite element technique. The effects of temperature gradient, seeding interface shape and seeding position on the thermal stress during the process were discussed based on the finite element analysis results.
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页码:170 / 179
页数:9
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