Optical properties and recombination mechanisms in GaN and GaN:Mg grown by metalorganic vapor phase epitaxy

被引:0
|
作者
G. P. Yablonskii
A. L. Gurskii
E. V. Lutsenko
I. P. Marko
B. Schineller
A. Guttzeit
O. Schön
M. Heuken
K. Heime
R. Beccard
D. Schmitz
H. Juergensen
机构
[1] National Academy of Sciences of Belarus,Institute of Physics
[2] RWTH Aachen,Institut für Halbleitertechnik
[3] AIXTRON AG,undefined
来源
Journal of Electronic Materials | 1998年 / 27卷
关键词
GaN; metalorganic vapor phase epitaxy (MOVPE); optical properties; photoluminescence; recombination mechanism;
D O I
暂无
中图分类号
学科分类号
摘要
Photoluminescence (PL) and reflection spectra of undoped and Mg-doped GaN single layers grown on sapphire substrates by metalorganic vapor phase epitaxy (MOVPE) were investigated in a wide range of temperatures, excitation intensities, and doping levels. The undoped layers show n-type conductivity (μ=400 cm2/Vs, n=3×1017 cm−3). After annealing at T=600–700°C, the Mg-doped layers showed p-type conductivity determined by the potential-profiling technique. A small value of the full width at half maximum (FWHM=2.8 meV) of the excitonic emission and a high ratio between excitonic and deep level emission (≈5300) are evidences of the high layer quality. Two donor centers with activation energies of 35 and 22 meV were observed in undoped layers. A fine structure of the PL band with two narrow lines in the spectral range of the donor-acceptor pair (DAP) recombination was found in undoped layers. An anomaly was established in the temperature behavior of two groups of PL lines in the acceptor-bound exciton and in donor-acceptor pair regions in Mg doped layers. The lower energy line quenched with increasing temperature appreciably faster than the high energy ones. Our data does not agree with the DAP recombination model. It suggests that new approaches are required to explain the recombination mechanisms in undoped and Mg-doped GaN epitaxial layers.
引用
收藏
页码:222 / 228
页数:6
相关论文
共 50 条
  • [31] Effect of carrier gas in hydride vapor phase epitaxy on optical and structural properties of GaN
    Gridneva, E.
    Richter, E.
    Feneberg, M.
    Weyers, M.
    Goldhahn, R.
    Traenkle, G.
    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2015, 252 (05): : 1180 - 1188
  • [32] Selective area growth of GaN using tungsten mask by metalorganic vapor phase epitaxy
    Kawaguchi, Y
    Nambu, S
    Sone, H
    Shibata, T
    Matsushima, H
    Yamaguchi, M
    Miyake, H
    Hiramatsu, K
    Sawaki, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1998, 37 (7B): : L845 - L848
  • [33] Structural and optical inhomogeneities of Fe doped GaN grown by hydride vapor phase epitaxy
    Malguth, E.
    Hoffmann, A.
    Phillips, M. R.
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (12)
  • [34] Characterization of Mg-doped GaN grown by metalorganic chemical vapor deposition
    Lachab, M
    Youn, DH
    Fareed, RSQ
    Wang, T
    Sakai, S
    SOLID-STATE ELECTRONICS, 2000, 44 (09) : 1669 - 1677
  • [35] Formation and optical characteristics of GaN:Eu/GaN core-shell nanowires grown by organometallic vapor phase epitaxy
    Otabara, T.
    Tatebayashi, J.
    Hasegawa, S.
    Timmerman, D.
    Ichikawat, S.
    Ichimiya, M.
    Ashida, M.
    Fujiwara, Y.
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (SD)
  • [36] Anomalous optical transitions in AlInGaN/GaN heterostructures grown by metalorganic chemical vapor deposition
    Soh, CB
    Chua, SJ
    Liu, W
    Lai, MY
    Tripathy, S
    SOLID STATE COMMUNICATIONS, 2005, 136 (07) : 421 - 426
  • [37] Growth evolution of GaN on GaP (001) substrate by metalorganic vapor phase epitaxy
    Wuu, DS
    Lin, WT
    Pan, CC
    Horng, RH
    Kung, CY
    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 2000, 1 : 335 - 338
  • [38] Step-flow metalorganic vapor phase epitaxy of GaN on SiC substrates
    Nishida, T
    Akasaka, T
    Kobayashi, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1998, 37 (4B): : L459 - L461
  • [39] Selective area growth and epitaxial lateral overgrowth of GaN by metalorganic vapor phase epitaxy and hydride vapor phase epitaxy
    Hiramatsu, K
    Matsushima, H
    Shibata, T
    Kawagachi, Y
    Sawaki, N
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1999, 59 (1-3): : 104 - 111
  • [40] Mosaic structure of ternary Al1-xInxN films on GaN grown by metalorganic vapor phase epitaxy
    Kariya, M
    Nitta, S
    Yamaguchi, S
    Amano, H
    Akasaki, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1999, 38 (9AB): : L984 - L986