Origin of Double-Rhombic Single Shockley Stacking Faults in 4H-SiC Epitaxial Layers

被引:0
|
作者
Johji Nishio
Chiharu Ota
Ryosuke Iijima
机构
[1] Toshiba Corporation,Corporate Research and Development Center
来源
关键词
4H-SiC; forward degradation; single Shockley stacking fault; partial dislocation; transmission electron microscopy;
D O I
暂无
中图分类号
学科分类号
摘要
We have investigated double-rhombic single Shockley stacking faults (DRSFs) in 4H-SiC epitaxial layers by analyzing structural details. A combination of plan-view transmission electron microscopy (TEM) and cross-sectional high-angle annular dark field scanning TEM made it possible to determine the Burgers vectors of partial dislocations that consist of DRSF boundaries and the type of glide of the original basal plane dislocations (BPDs). From these results, the origins of DRSFs were identified as BPDs that originated as 60-degree perfect dislocations, and the inclination of the DRSFs was found to depend on the Burgers vectors and the type of glide of the original BPDs. Also, the configuration of the accompanying threading edge dislocations (TEDs) at both ends of the BPDs was categorized into two types, namely (1) TEDs at both ends of the BPD segments toward the surface of the epitaxial layer (cis-configuration) which form the half-loop arrays, and (2) a TED at one end of the BPD from the deeper side of the epitaxial layer and another toward the surface of the epitaxial layer (trans-configuration), and the original BPD segments were isolated. The shrinking processes of the DRSFs were also examined, and it was found that they were not a reversal of the expansion process.
引用
收藏
页码:679 / 690
页数:11
相关论文
共 50 条
  • [21] Machine-learning enhanced thermal stability investigation of single Shockley stacking faults in 4H-SiC
    Chen, Haonan
    Kang, Wenyu
    Lin, Wei
    Kang, Junyong
    COMPUTATIONAL MATERIALS SCIENCE, 2024, 242
  • [22] Structural study of single Shockley stacking faults terminated near substrate/epilayer interface in 4H-SiC
    Nishio, Johji
    Ota, Chiharu
    Iijima, Ryosuke
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2022, 61 (SC)
  • [23] Sources of Epitaxial Growth-Induced Stacking Faults in 4H-SiC
    Feng, Gan
    Suda, Jun
    Kimoto, Tsunenobu
    JOURNAL OF ELECTRONIC MATERIALS, 2010, 39 (08) : 1166 - 1169
  • [24] Sources of Epitaxial Growth-Induced Stacking Faults in 4H-SiC
    Gan Feng
    Jun Suda
    Tsunenobu Kimoto
    Journal of Electronic Materials, 2010, 39 : 1166 - 1169
  • [25] Morphology of single Shockley-type stacking faults generated by recombination enhanced dislocation glide in 4H-SiC
    Matsuhata, Hirofumi
    Sekiguchi, Takashi
    PHILOSOPHICAL MAGAZINE, 2018, 98 (10) : 878 - 898
  • [26] Cathodoluminescence study of the properties of stacking faults in 4H-SiC homoepitaxial layers
    Maximenko, Serguei I.
    Freitas, Jaime A., Jr.
    Klein, Paul B.
    Shrivastava, Amitesh
    Sudarshan, Tangali S.
    APPLIED PHYSICS LETTERS, 2009, 94 (09)
  • [27] Injected carrier concentration dependence of the expansion of single Shockley-type stacking faults in 4H-SiC PiN diodes
    Tawara, T.
    Matsunaga, S.
    Fujimoto, T.
    Ryo, M.
    Miyazato, M.
    Miyazawa, T.
    Takenaka, K.
    Miyajima, M.
    Otsuki, A.
    Yonezawa, Y.
    Kato, T.
    Okumura, H.
    Kimoto, T.
    Tsuchida, H.
    JOURNAL OF APPLIED PHYSICS, 2018, 123 (02)
  • [29] An electronic energy model for multi-stacking faults in reducing carrier lifetime in 4H-SiC epitaxial layers
    Hou, Pengxiang
    Wang, Pin
    Li, Yifei
    Zhong, Weiliang
    Han, Yuebin
    Wang, Jing
    Yu, Le
    Li, Zheyang
    Jin, Rui
    JOURNAL OF CRYSTAL GROWTH, 2025, 650
  • [30] Stacking faults in 4H-SiC epilayers and IGBTs
    Wang, Pin
    Cheng, Weiwei
    Li, Yifei
    Xu, Lei
    Hou, Pengxiang
    Yu, Le
    Li, Yun
    Li, Zheyang
    Jin, Rui
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2024, 177