VUV laser ablation of insulators

被引：0

作者：

P.E. Dyer

C.D. Walton

机构：

[1] University of Hull,Department of Physics

来源：

Applied Physics A | 2004年 / 79卷

关键词：

Microstructure; Coherence; Experimental Investigation; Laser Ablation; Surface Quality;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

We present theoretical and experimental investigations of factors that may influence the surface quality of insulators patterned by 157 nm F2 laser ablation. Aspects covered include modelling of beam spatial coherence and diffraction effects for proximity mask exposure, and the role of melt relaxation on surface microstructures. Experimental results for micron-scale patterning of N-BK7 glass and NaCl crystals using proximity masks are presented and discussed within the framework of the modelling.

引用

页码：721 / 727

页数：6