Engineered CVD Diamond Coatings for Machining and Tribological Applications

被引:0
作者
Ravikumar Dumpala
Maneesh Chandran
M. S. Ramachandra Rao
机构
[1] GMR Institute of Technology,Department of Physics and Materials Science Research Centre, Nano Functional Materials Technology Centre
[2] Indian Institute of Technology Madras,undefined
来源
JOM | 2015年 / 67卷
关键词
Diamond Film; Diamond Coating; Chemical Vapor Deposition Diamond; Diamond Growth; Tribological Application;
D O I
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中图分类号
学科分类号
摘要
Diamond is an allotropes of carbon and is unique because of its extreme hardness (~100 GPa), low friction coefficient (<0.05), high thermal conductivity (~2000 Wm−1 K−1), and high chemical inertness. Diamond is being synthesized artificially in bulk form as well as in the form of surface coatings for various engineering applications. The mechanical characteristics of chemical vapor deposited (CVD) diamond coatings such as hardness, adhesion, friction coefficient, and fracture toughness can be tuned by controlling the grain size of the coatings from a few microns to a few nanometers. In this review, characteristics and performance of the CVD diamond coatings deposited on cemented tungsten carbide (WC-Co) substrates were discussed with an emphasis on WC-Co grade selection, substrate pretreatment, nanocrystallinity and microcrystallinity of the coating, mechanical and tribological characteristics, coating architecture, and interfacial adhesion integrity. Engineered coating substrate architecture is essential for CVD diamond coatings to perform well under harsh and highly abrasive machining and tribological conditions.
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页码:1565 / 1577
页数:12
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