Efficiency Improvements in AlGaN-Based Deep-Ultraviolet Light-Emitting Diodes with Graded Superlattice Last Quantum Barrier and Without Electron Blocking Layer

被引:0
作者
Xiu Zhang
Huiqing Sun
Jing Huang
Tianyi Liu
Xin Wang
Yaohua Zhang
Shupeng Li
Sheng Zhang
Yufei Hou
Zhiyou Guo
机构
[1] South China Normal University,Institute of Opto
[2] Guangdong Provincial Engineering Technology Research Center for Low Carbon and Advanced Energy Materials,Electronic Materials and Technology
来源
Journal of Electronic Materials | 2019年 / 48卷
关键词
AlGaN/AlGaN graded superlattice; last quantum barrier; DUV light-emitting diodes;
D O I
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学科分类号
摘要
The characteristics of AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) with electroluminescence peak wavelength of emission about 289 nm have been investigated by optimizing the last quantum barrier (LQB) in the active region. The results demonstrate that the internal quantum efficiency and radiative recombination rate of DUV-LEDs with a graded superlattice last quantum barrier (GSL LQB) and without an electron blocking layer (EBL) are higher than for other structures under current of 180 mA. Also, the electron and hole leakage currents are reduced for the GSL LQB structure. This structure contributes to effective electron confinement and hole injection owing to increased overlap of electron and hole wavefunctions resulting from low electrostatic fields in the active region. As a result, the optical output power of the structure with a GSL LQB and without an EBL is increased by 1.62 times, and the spontaneous emission intensity by 1.56 times, compared with the conventional structure.
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页码:460 / 466
页数:6
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