Residual stress modeling and analysis for micro electroforming layer

被引:0
作者
Chang Song
Liqun Du
Xiaojun Li
Yuanqi Li
Leijie Qi
Yu Li
机构
[1] Dalian University of Technology,Key Laboratory for Precision and Non
[2] Dalian University of Technology,traditional Machining Technology of Ministry of Education
来源
Microsystem Technologies | 2017年 / 23卷
关键词
Residual Stress; Residual Stress Distribution; Finite Element Analysis Model; Intrinsic Stress; Maximum Residual Stress;
D O I
暂无
中图分类号
学科分类号
摘要
Large residual stress in the micro electroforming layer has been considered to be the main reason for causing warpage, delamination and micro cracking of the microdevice. These undesirable phenomena dramatically influence the productivity, dimensional accuracy and service life of the microdevice. Reasonable control of the residual stress is a direct and efficient way to improve the production rate of microdevice and expand the application of microdevice. In this paper, the residual stress finite element analysis (FEA) simulation model for Ni micro electroforming layer was established by the method of “Equivalent Reference Temperature (ERT)”. The simulation result shows that the ERT for Ni micro electroforming layer is 238.15 K. The error of residual stress value is 0.37% between the simulation result and the experimental result. This error value proves the accuracy of the FEA model.
引用
收藏
页码:4709 / 4716
页数:7
相关论文
共 31 条
[1]  
Chen HC(2011)Residual stress analysis for oxide thin film deposition on flexible substrate using finite element method Proc SPIE 8168 1-8
[2]  
Chen YH(1992)Genesis of influencing factors of the stress of metallic depositing coatings Plat Finish 14 15-19
[3]  
Lin SF(2010)Experiments on ultrasonic stress relief used in micro electrodeposited coating Nanotechnol Precis Eng 8 143-148
[4]  
Chen SH(2003)Mechanics of compressive stress evolution during thin film growth J Mech Phys Solids 51 2127-2148
[5]  
Cheng DH(1999)Residual stresses in electrodeposits of nickel and nickel–iron alloys Surf Coat Technol 122 118-135
[6]  
Guo HT(2001)Electroforming process and application to micro/macro manufacturing CIRP Ann Manuf Technol 50 499-514
[7]  
Liu SL(2003)Intrinsic strain modeling and residual stress analysis for thin-film processing of layered structures J Electron Packag 125 4-17
[8]  
Du LQ(1909)The tension of metallic films deposited by electrolysis Pro the R Soc 82 172-175
[9]  
Song L(1996)Stress and grain growth in thin films J Mech Phys Solids 44 657-673
[10]  
Wang QJ(2013)Diffusing and swelling in SU-8: insight in material properties and processing J Micromech Microeng 20 95013-95022