Plasmonic multilayer structure for ultrathin amorphous silicon film photovoltaic cell

被引：0
|
作者：
Chien-Chang Chao
Chih-Ming Wang
Yia-Chung Chang
Jenq-Yang Chang
机构：
[1] National Central University,Department of Optics and Photonics
[2] National Dong Hwa University,Institute of Opto
[3] Academia Sinica,electronic Engineering
来源：
Optical Review | 2009年 / 16卷
关键词：
plasmonic multilayer; amorphous silicon; photovoltaic; surface plasmons;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
A plasmonic multilayer structure (PMS) is proposed for photovoltaic cells with an ultrathin active layer that is 30 nm amorphous Si (α-Si). The optical properties of the PMS are analyzed by rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) method. Using the PMS, the incident light can be trapped into localized surface plasmon (LSP) and then the localized surface plasmon induces the surface plasmon (SP) that propagates transversely within the α-Si layer. Compared with the indium tin oxide (ITO)/α-Si/Ag structure, the photon number absorbed by PMS increase 28.7% while a normal incident transverse magnetic (TM) polarization wave is applied.
引用
收藏
页码：343 / 346
页数：3
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