Low-temperature processing of inkjet-printed IZO thin-film transistors

被引:0
作者
Jun Seok Lee
Woon-Seop Choi
机构
[1] Hoseo University,Department of Display Engineering
来源
Journal of the Korean Physical Society | 2014年 / 64卷
关键词
Inkjet; Low-temperature process; Indium-zinc-oxide (IZO); Thin-film transistor (TFT);
D O I
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中图分类号
学科分类号
摘要
Inkjet-printed indium-zinc oxide (IZO) thin-film transistors (TFTs) were prepared at a processing temperature of 200 °C for the first time. The formulation of the inkjet solution and the process optimization resulted in a mobility of 0.45 cm2/Vs, a threshold voltage of 7 V, an on-to-off current ratio of 105 and a subthreshold slope of 0.5 V/dec at the low annealing temperature of 200 °C, the best properties in the inkjet process thus far. The metal-oxide formation at 200 °C was confirmed by using X-ray photoelectron Spectroscopy. The bias stability of an inkjet-printed IZO TFT at 200 °C was also characterized.
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页码:701 / 705
页数:4
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