Photosorption of oxygen and nitric oxide by aluminum and silicon oxides under conditions of troposphere

被引：0
|
作者：
V. S. Zakharenko
A. N. Moseichuk
V. N. Parmon
机构：
[1] Russian Academy of Sciences,Boreskov Institute of Catalysis, Siberian Division
[2] Russian Academy of Sciences,Institute of Petroleum Chemistry, Siberian Division
来源：
High Energy Chemistry | 2005年 / 39卷
关键词：
Oxide; Oxygen; Aluminum; Silicon; Physical Chemistry;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The photosorption characteristics of finely divided γ-Al2O3 and SiO2 with the state of the surface formed under long-term action of atmospheric air, were studied. The effective quantum yields and the action spectra of photoinduced adsorption of oxygen and nitric oxide were determined. It has been assumed that the absence of noticeable photoinduced adsorption of halogenated compounds on these powdered aluminum and silicon oxides is due to their low degree of crystallinity.
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页码：154 / 157
页数：3
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