The magnetic field-assisted assembly of nanoscale semiconductor devices: A new technique

被引:0
作者
Sudhakar Shet
Vishal R. Mehta
Anthony T. Fiory
N. M. Ravindra
Martin P. Lepselter
机构
[1] the New Jersey Institute of Technology,
[2] BTL Fellows Inc.,undefined
来源
JOM | 2004年 / 56卷
关键词
IEEE Photon; Magnetic Layer; Substrate Wafer; Selective Area Growth; Jersey Institute;
D O I
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中图分类号
学科分类号
摘要
Magnetic field-assisted assembly is an integration technique for the efficient placement of a large number of nanodevices into receptor sites etched in semiconductor wafers with or without circuitry. The diverging flux from a magnetic field source helps in attaching heterostructure nanodevices into wafers. Various approaches of magnetic field-assisted assembly using air pressure, vibration assistance, fluid, and feed tape are briefly explained in this article. Magnetic field-assisted assembly is anticipated to become a manufacturing approach that will be driven by its simplicity and promise of high yield at low cost.
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页码:32 / 34
页数:2
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