Development of Field Alignment Methods for Electron-Вeam Lithography in the Case of X-Ray Bragg–Fresnel Lenses

被引：1

作者：

Knyazev M.A. ^{[1
]}

Svintsov A.A. ^{[1
]}

Fahrtdinov R.R. ^{[1
]}

机构：

[1] Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, Chernogolovka, Moscow oblast

来源：

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques | 2018年 / 12卷 / 5期

基金：

俄罗斯基础研究基金会;

关键词：

diffraction gratings; electron-beam lithography; X-ray optics;

D O I：

10.1134/S1027451018050270

中图分类号：

学科分类号：

摘要：

A method providing more than a tenfold improvement in the precision of exposure field alignment in electron-beam lithography is proposed. The method uses a scanning electron microscope with a standard mechanical positioning system and alignment markers produced by contact photolithography. Bragg–Fresnel lens (1–3–5 orders) with a tenfold decrease in the error of exposure field alignment through the use of mechanical stages are created via this technique. © 2018, Pleiades Publishing, Ltd.

引用

页码：957 / 960

页数：3

共 9 条

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