Electrodeposition of aluminum from molten AlCl3–NaCl–KCl mixture

被引：0
作者：
M. Jafarian
M. G. Mahjani
F. Gobal
I. Danaee
机构：
[1] K.N. Toosi University of Technology,Departement of chemistry
[2] Sharif University of Technology,Departement of chemistry
来源：
Journal of Applied Electrochemistry | 2006年 / 36卷
关键词：
aluminum; diffusion coefficient; electrodeposition; KI; molten salt;
D O I：
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中图分类号：
学科分类号：
摘要：
Electrochemical deposition of aluminum from basic and acidic molten NaCl-KCl-AlCl3 mixture on a graphite electrode at 140 °C was studied by voltammetry, chronopotentiometry and constant current deposition. The deposition of aluminum was found to proceed via a nucleation/growth mechanism in basic melt, while it was found to be diffusion controlled in acidic melt. The diffusion coefficient calculated for Al2Cl−7 ions in acidic melt by voltammetry was in agreement with the deductions of voltammetry. The morphology of the aluminum deposits was examined using a metallographic microscope and by SEM. It was shown that, depending on the current density (c.d.) and AlCl3 concentration (acidic or basic melt) different aluminum morphologies were evident but a silver-bright, compact, and very stable metallic form of aluminum deposit was obtained in acidic melt with KI addition as surfactant.
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页码：1169 / 1173
页数：4
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