Electrodeposition of aluminum from molten AlCl3–NaCl–KCl mixture

被引：0

作者：

M. Jafarian

M. G. Mahjani

F. Gobal

I. Danaee

机构：

[1] K.N. Toosi University of Technology,Departement of chemistry

[2] Sharif University of Technology,Departement of chemistry

来源：

Journal of Applied Electrochemistry | 2006年 / 36卷

关键词：

aluminum; diffusion coefficient; electrodeposition; KI; molten salt;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Electrochemical deposition of aluminum from basic and acidic molten NaCl-KCl-AlCl3 mixture on a graphite electrode at 140 °C was studied by voltammetry, chronopotentiometry and constant current deposition. The deposition of aluminum was found to proceed via a nucleation/growth mechanism in basic melt, while it was found to be diffusion controlled in acidic melt. The diffusion coefficient calculated for Al2Cl−7 ions in acidic melt by voltammetry was in agreement with the deductions of voltammetry. The morphology of the aluminum deposits was examined using a metallographic microscope and by SEM. It was shown that, depending on the current density (c.d.) and AlCl3 concentration (acidic or basic melt) different aluminum morphologies were evident but a silver-bright, compact, and very stable metallic form of aluminum deposit was obtained in acidic melt with KI addition as surfactant.

引用

页码：1169 / 1173

页数：4

共 67 条

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