Lithium intercalation in sputtered MoO3 films

被引：0
|
作者：
B. Yebka
C. Julien
机构：
[1] Université Pierre et Marie Curie,Laboratoire des Milieux Désordonnés et Hétérogènes, associé au CNRS UA800
来源：
Ionics | 1997年 / 3卷
关键词：
Nickel; Molybdenum; MoO3; Glass Plate; Electrochemical Property;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Molybdenum trioxide films have been prepared by RF-sputtering using an oxygen-argon mixture containing sputter gas and a molybdenum target. Samples were deposited at different oxygen flow rates in the range from 1.5 to 8 cm3/min onto ITO-covered thick glass plate or nickel foil substrates. Lithium intercalation of RF-sputtered films has been tested in Li/1M LiClO4-PC-PMMA/MoO3 galvanic cells. We report the electrochemical properties of various lithium-intercalated MoO3 films. Influence of both the growth conditions and the nature of the film substrate have been investigated on the discharge behavior of cells and on the kinetics of intercalation.
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页码：83 / 88
页数：5
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