In-plane ferroelectric tunnel junctions based on 2D α-In2Se3/semiconductor heterostructures

被引:0
作者
Zifang Liu
Pengfei Hou
Lizhong Sun
Evgeny Y. Tsymbal
Jie Jiang
Qiong Yang
机构
[1] Xiangtan University,Hunan Provincial Key Laboratory of Thin Film Materials and Devices, School of Materials Science and Engineering
[2] University of Nebraska,Department of Physics and Astronomy
来源
npj Computational Materials | / 9卷
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Ferroelectric tunnel junctions (FTJs) have great potential for application in high-density non-volatile memories. Recently, α-In2Se3 was found to exhibit robust in-plane and out-of-plane ferroelectric polarizations at a monolayer thickness, which is ideal to serve as a ferroelectric component in miniaturized electronic devices. In this work, we design two-dimensional van der Waals heterostructures composed of an α-In2Se3 ferroelectric and a hexagonal IV–VI semiconductor and propose an in-plane FTJ based on these heterostructures. Our first-principles calculations show that the electronic band structure of the designed heterostructures can be switched between insulating and metallic states by ferroelectric polarization. We demonstrate that the in-plane FTJ exhibits two distinct transport regimes, tunneling and metallic, for OFF and ON states, respectively, leading to a giant tunneling electroresistance effect with the OFF/ON resistance ratio exceeding 1 × 104. Our results provide a promising approach for the high-density ferroelectric memory based on the 2D ferroelectric/semiconductor heterostructures.
引用
收藏
相关论文
共 113 条
[1]  
Esaki AL(1971)Polar switch IBM Tech. Discl. Bull. 13 114-183
[2]  
Laibowitz R(2006)Tunneling across a ferroelectric Science 313 181-5702
[3]  
Stiles P(2005)Theoretical current-voltage characteristics of ferroelectric tunnel junctions Phys. Rev. B 72 125341-621
[4]  
Tsymbal EY(2012)Ferroelectric tunnel memristor Nano Lett. 12 5697-7393
[5]  
Kohlstedt H(2014)Ferroelectric tunnel junctions for information storage and processing Nat. Commun. 5 617-509
[6]  
Kohlstedt H(2017)Giant tunnelling electroresistance in metal/ferroelectric/semiconductor tunnel junctions by engineering the Schottky barrier Nat. Commun. 8 232902-48
[7]  
Pertsev NA(2013)Ferroelectric-field-effect-enhanced electroresistance in metal/ferroelectric/semiconductor tunnel junctions Nat. Mater. 12 16009-339
[8]  
Contreras JR(2012)Tunnel electroresistance in junctions with ultrathin ferroelectric Pb(Zr Appl. Phys. Lett. 100 197602-1258
[9]  
Waser R(2016)Ti NPJ Comput. Mater. 2 155420-181
[10]  
Kim DJ(2016))O Phys. Rev. Lett. 116 7385-10746