A Helicon Plasma Source

被引：2

作者：

Braginskii O.V. ^{[1
]}

Vasil'eva A.N. ^{[1
]}

Kovalev A.S. ^{[1
]}

机构：

[1] Skobeltsyn Res. Inst. of Nucl. Phys., Moscow State University, Vorob'evy gory, Moscow

来源：

Russian Microelectronics | 2000年 / 29卷 / 6期

关键词：

Magnetic Field; Argon; Electron Distribution; Plasma Source; Argon Pressure;

D O I：

10.1023/A:1026688002366

中图分类号：

学科分类号：

摘要：

The parameters of a helicon plasma source was studied for an rf power to 500 W and a magnetic field ranging from 0 to 200 G under an argon pressure of 3 mtorr. The electron density in the plasma was found to reach 1012 cm-3. Axial and radial electron distributions were studied. Helicon waves were excited by antennas of three types, a loop antenna being the most efficient. It is shown that the electron density in the plasma can significantly be increased if the system is under a nonuniform magnetic field such that its lower-value (relative to the rest of the system) part is applied to the antenna.

引用

页码：380 / 390

页数：10

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