A Helicon Plasma Source

被引：2
作者：
Braginskii O.V. [1 ]
Vasil'eva A.N. [1 ]
Kovalev A.S. [1 ]
机构：
[1] Skobeltsyn Res. Inst. of Nucl. Phys., Moscow State University, Vorob'evy gory, Moscow
来源：
Russian Microelectronics | 2000年 / 29卷 / 6期
关键词：
Magnetic Field; Argon; Electron Distribution; Plasma Source; Argon Pressure;
D O I：
10.1023/A:1026688002366
中图分类号：
学科分类号：
摘要：
The parameters of a helicon plasma source was studied for an rf power to 500 W and a magnetic field ranging from 0 to 200 G under an argon pressure of 3 mtorr. The electron density in the plasma was found to reach 1012 cm-3. Axial and radial electron distributions were studied. Helicon waves were excited by antennas of three types, a loop antenna being the most efficient. It is shown that the electron density in the plasma can significantly be increased if the system is under a nonuniform magnetic field such that its lower-value (relative to the rest of the system) part is applied to the antenna.
引用
收藏
页码：380 / 390
页数：10
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