Study of birefringence in porous silicon layers by IR Fourier spectroscopy

Birefringence in porous silicon layers prepared with different etching currents on a (110) substrate is studied by IR Fourier spectroscopy. The spectra exhibit beats in the intensity of transmitted and reflected radiation due to the summation of the intensities of the ordinary and extraordinary waves interfering in the porous layer. An analysis of the spectra shows the layers to exhibit properties of a negative uniaxial crystal with the optical axis lying in the layer plane. The difference between the refractive indices of the ordinary and extraordinary waves for a layer with a porosity of 80% reaches 18%. The experimental data are in agreement with the calculations based on the effective-medium approximation, which takes into account the anisotropy of silicon nanocrystal arrangement in a porous layer.