High-resolution x-ray diffraction study of In0.25Ga0.75Sb/InAs superlattice

被引:0
作者
A. Vigliante
H. Homma
J. T. Zborowski
T. D. Golding
S. C. Moss
机构
[1] University of Houston,Department of Physics
[2] Max-Planck-Institut für Metallforschung,undefined
[3] Hyogo University,undefined
来源
Journal of Materials Research | 1999年 / 14卷
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摘要
An In0.25Ga0.75Sb/InAs strained-layer superlattice, grown by molecular-beam epitaxy (MBE) on a GaSb[001] substrate, has been characterized by four-circle x-ray diffractometry. This system, proposed by Maliot and Smith for ir detection application, is challenging because of the two group V species and the likelihood of cross-incorporation of the different elements during growth, leading possibly to interdiffusion and thus, to a more diffuse interface. High-resolution x-ray diffraction (XRD) profiles were obtained about several reciprocal lattice points in order to extract a reliable set of structural parameters. The profiles were then successfully modeled by computer simulation. The presence of many sharp higher-order satellite reflections in the XRD profiles is a measure of the high quality of the superlattices. The normal and lateral structural coherence was also measured and will be discussed.
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页码:1744 / 1751
页数:7
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