Characteristics of Ir etching using Ar/Cl2 inductively coupled plasmas

被引：0
作者：
SE-GEUN PARK
CHIN-WOO KIM
HO-YOUNG SONG
HYOUN WOO KIM
JU HYUN MYUNG
SUKHO JOO
SOON OH PARK
KYU-MANN LEE
机构：
[1] Inha University,Micro Photonics Advanced Research Center, School of Information and Communication Engineering
[2] Inha University,School of Materials Science and Engineering
[3] Samsung Electronics Co. Ltd.,Semiconductor R&D Center
[4] Korea University of Technology and Education,Department of Materials Engineering
来源：
Journal of Materials Science | 2005年 / 40卷
关键词：
Polymer;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：5015 / 5016
页数：1
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