Beam optics optimization of a negative-ion sputter source

被引:0
作者
F Osswald
R Rebmeister
机构
[1] UMR 7500 CNRS-IN2P3/ULP,Institut de Recherches Subatomiques
来源
Pramana | 2002年 / 59卷
关键词
Negative-ion source; sputtering; beam optics; 41.85; 41.75.C; 79.20.R; 29.25.LN;
D O I
暂无
中图分类号
学科分类号
摘要
A negative-ion sputter source has been studied in order to increase the beam intensity delivered by the Vivitron tandem injector. The aim was to characterize the influence on the beam intensity of some factors related to the configuration of the source such as the shape of the target holder, the target surface topography and the anode/cathode voltage. The paper reports the results carried out by experimentation on a test facility and on the injector itself as well as the investigations performed with computer simulations.
引用
收藏
页码:795 / 804
页数:9
相关论文
共 13 条
  • [1] Middleton R(1974)undefined Nucl. Instrum. Methods 118 329-329
  • [2] Krohn V E(1962)undefined J. Appl. Phys. 23 3523-3523
  • [3] Mueller M(1969)undefined IEEE Trans. Nucl. Sci. 16 38-38
  • [4] Sigmund P(1969)undefined Phys. Rev. 184 383-383
  • [5] W Eckstein(2002)undefined Nucl. Instrum. Methods B119 477-477
  • [6] Alton G D(1986)undefined Surf. Sci. 175 226-226
  • [7] Brown T A(2000)undefined Nucl. Instrum. Methods B172 344-344
  • [8] Roberts M L(1975)undefined Nucl. Instrum. Methods 124 299-299
  • [9] Southon J R(1988)undefined Surf. Sci. 198 431-431
  • [10] Chapman K R(1984)undefined Appl. Phys. A34 73-73