Optical properties of submonolayer germanium clusters formed by molecular-beam epitaxy in a silicon matrix

被引：0

作者：

G. É. Cirlin

P. Werner

G. Gösele

B. V. Volovik

V. M. Ustinov

N. N. Ledentsov

机构：

[1] Max Planck Institute of Microstructure Physics,Ioffe Physicotechnical Institute

[2] Russian Academy of Sciences,Institute of Analytical Instrument Building

[3] Technical University,undefined

[4] Russian Academy of Sciences,undefined

来源：

Technical Physics Letters | 2001年 / 27卷

关键词：

Silicon; Optical Property; Germanium; Molecular Beam Epitaxy; Molecular Beam;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Study of the optical properties of submonolayer germanium clusters formed by molecular beam epitaxy in a silicon matrix showed that the spectra of samples obtained at elevated deposition temperatures (∼750°C) contain a series of new bands related to the formation of germanium nanoislands.

引用

页码：14 / 16

页数：2

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