Analysis of pure copper – a comparison of analytical methods

被引：4
作者：
Britta Lange
Sebastian Recknagel
Michael Czerwensky
Ralf Matschat
Matthias Michaelis
Burkhard Peplinski
Ulrich Panne
机构：
[1] Federal Institute for Materials Research and Testing (BAM),Department of Analytical Chemistry, Reference Materials
来源：
Microchimica Acta | 2008年 / 160卷
关键词：
Keywords: Pure copper; elemental analytical methods; reference material; sample dissolution;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The reliability and performance of various analytical methods for the determination of 22 trace elements in pure copper is compared and discussed. The work was performed in the framework of an interlaboratory comparison for the preparation of four pure copper reference materials with graded element mass fractions of Ag, Al, As, Bi, Cd, Co, Cr, Fe, Mg, Mn, Ni, P, Pb, S, Sb, Se, Si, Sn, Te, Ti, Zn, and Zr. Special analytical results (ET-AAS, ICP-MS) obtained by the authors were described in more detail and were compared to the certified values. Special regard was paid to the influence of the copper matrix on performance and sensitivity of each analytical method and to the dissolution procedure of copper matrix and interferences from insoluble residues. For a generalized evaluation of the figures of merit for each applied elemental analytical method results from several independent laboratories were included in the discussion.
引用
收藏
页码：97 / 107
页数：10
相关论文
共 50 条
  • [1] Murarka S P(1995)Copper metallization for ULSI and beyond Cr Rev Sol State 20 87-undefined
  • [2] Hymes S W(2002)Progress in copper: a look ahead Semiconductor Int 25 46-undefined
  • [3] Singer P(2004)Role of matrix material in the characterization of high-purity copper by flame and graphite furnace AAS Indian J Chem Techn 11 170-undefined
  • [4] Kumar S A(1993)Analysis of impurities in high-purity copper by zeeman graphite furnace AAS At Spectrosc 14 1-undefined
  • [5] Sanglikar M B(1997)Trace analysis of selected high-purity metals using high-resolution inductively coupled plasma mass spectrometry and inductively coupled plasma optical emission spectrometry Phys Stat Sol (a) 160 567-undefined
  • [6] Shaikh M S(1997)Investigations concerning the analysis of high-purity metals (Cd, Cu, Ga and Zn) by high resolution inductively coupled plasma mass spectrometry Fresen J Anal Chem 359 418-undefined
  • [7] Sudersanan M(1999)Quality assurance of arsenic, lead, tin and zinc in copper alloys using axial inductively coupled plasma time-of-flight mass spectrometry (ICP-TOF-MS) J Anal At Spectrom 14 1567-undefined
  • [8] Milella E(1999)Determination of trace impurities in high purity copper using sector-field ICP-MS: continuous nebulization, flow injection analysis and laser ablation Fresen J Anal Chem 364 410-undefined
  • [9] Sentimenti E(2001)Determination of elements by nuclear analytical methods Fresen J Anal Chem 369 8-undefined
  • [10] Mazzetto G(2002)RBS, SY-XRF, INAA and ICP-IDMS of antimony implanted in silicon – a multi-method approach to characterize and certify a reference material Nucl Instrum Methods 188 120-undefined
12345