High-Frequency Point-Contact Spectroscopy of TiSi2, TaSi2, and VSi2

被引:0
作者
O. P. Balkashin
A. G. M. Jansen
O. Laborde
U. Gottlieb
G. L. Sukhodub
P. Wyder
I. K. Yanson
机构
[1] National Academy of Science of Ukraine,B. Verkin Institute for Low Temperature Physics and Engineering
[2] Max-Planck-Institute für Festkörperforschung andCentre National de la Recherche Scientifique,Grenoble High Magnetic Field Laboratory
[3] associé à l'Université Joseph Fourier,Centre de Recherches sur les Très Basses Températures
[4] CNRS,Laboratoire des Matériaux et du Génie Physique,École Nationale Supérieure de Physique de Grenoble
[5] INPG,undefined
来源
Journal of Low Temperature Physics | 2002年 / 129卷
关键词
Spectroscopy; Experimental Data; Magnetic Material; Spectral Function; Calculated Dependence;
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摘要
High-frequency point-contact spectroscopy as well as conventional low-frequency PC spectroscopy has been used for determining the spectral functions of the electron-phonon interaction (EPI) for three disilicides TiSi2, TaSi2, and VSi2. The temperature dependences of resistivity have been calculated from obtained EPI functions. Comparison of calculated dependences with known experimental data allowed correction of the electron-phonon interaction constants for the studied disilicides.
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页码:105 / 116
页数:11
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