Composition and structure of silicon carbonitride layers grown on Si(100)/(Fe, N, Co) substrates

被引：0
作者：
N. I. Fainer
V. I. Kosyakov
Yu. M. Rumyantsev
E. A. Maximovskii
S. A. Prokhorova
P. N. Gevko
机构：
[1] Russian Academy of Sciences,A. V. Nikolaev Institute of Inorganic Chemistry, Siberian Division
来源：
Journal of Structural Chemistry | 2012年 / 53卷
关键词：
silicon carbonitride; structure; thin films; crystal shapes; Si(100) substrates; Fe-Ni-Co alloy; IR spectroscopy; Raman spectroscopy; AFM; SEM; SR-XRD;
D O I：
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中图分类号：
学科分类号：
摘要：
The phase and chemical composition of silicon carbonitride films obtained by plasma-enhanced chemical vapor deposition on Si(100) substrates and the same substrates covered by a layer of (Fe, Ni, Co) alloy is studied. It is shown that substrate metallization practically does not change the chemical composition of the film, but affects the ratio phases present in the film and the film nanostructure.
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页码：812 / 818
页数：6
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