Performance characterization of InGaP Schottky contact with ITO transparent electrodes

被引:0
作者
Ching-Ting Lee
Ching-Hung Fu
Chang-Da Tsai
Wei Lin
机构
[1] National Central University,Institute of Optical Sciences
[2] Chunghwa Telecom Co.,Telecommunication Laboratories
[3] Ltd.,undefined
来源
Journal of Electronic Materials | 1998年 / 27卷
关键词
InGaP; ITO; Schottky contact;
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学科分类号
摘要
We present the Schottky performance of transparent ITO on a wide bandgap InGaP semiconductor. For a transparent ITO Schottky electrode on InGaP, a transmittance of higher than 0.9, and a refractive index of 1.88 for a wavelength of 820 nm were obtained. We measured its associated resistivity as 1.94×10−3 Ω-cm after annealing at 300°C for 60 min under oxygen ambience. The effect of the thermal annealing temperature on the crystallization of ITO was examined by x-ray diffraction. As well an associated Schottky barrier height of 0.93 eV and an ideality factor of 1.07 were found using the Schottky diode configuration. The results indicate that ITO is a promising transparent Schottky material for electrooptical devices based on InGaP structures.
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页码:1017 / 1021
页数:4
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