Effects of deposition temperature and annealing temperature on the morphology and electrochemical capacitance of Ni(OH)2 thin films

被引:0
作者
Guangwu Yang
Yunqiang Wu
Baoli Wang
Wenyue Guo
Zhaoyan Ren
Zhongheng Bu
Chengcheng Miao
Hulin Li
机构
[1] China University of Petroleum,College of Science
[2] Experiment and Test Research Institute,School of Geosciences
[3] China University of Petroleum,College of Chemistry and Chemical Engineering
[4] Lanzhou University,undefined
来源
Journal of Solid State Electrochemistry | 2012年 / 16卷
关键词
Nickel hydroxide; Nickel foam; Electrodeposition; Annealing; Electrochemical capacitor;
D O I
暂无
中图分类号
学科分类号
摘要
In this paper, we report 3D nickel (II) hydroxide thin films with porous nanostructures prepared on Ni foam by direct current electrodeposition from aqueous solution of Ni(NO3)2 through basic chemicals. The effect of deposition temperature on Ni(OH)2 thin film morphology is examined by field emission scanning electron microscopy, which is found to have significant influence on capacitance performance of Ni(OH)2 thin films. Moreover, the effect of annealing temperature on electrochemical capacitance and long-time stability of Ni(OH)2 thin films is investigated. An optimum-specific capacitance value of 2,447 farads g−1 is obtained for Ni(OH)2 thin film deposited at 20 °C and annealed at 100 °C.
引用
收藏
页码:3761 / 3767
页数:6
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