N-type In (or Al) doped Cu2O thin films by magnetron sputtering

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作者：
A. Lakshmanan
Zachariah C. Alex
S. R. Meher
机构：
[1] Vellore Institute of Technology,Department of Physics, School of Advanced Sciences
[2] Vellore Institute of Technology,Department of Sensor and Biomedical Technology, School of Electronics Engineering
来源：
The European Physical Journal Plus | / 139卷
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