Effect of reactive ion etching on the surface of polymethylmethacrylate

被引：5
作者：
Mironova A.A. [1 ]
Popov A.M. [1 ]
Zanaveskin M.L. [1 ]
机构：
[1] Kurchatov Centre for Convergence of Nano-, Bio-, Information, and Cognitive Sciences and Technologies, National Research Centre Kurchatov Institute, Moscow
来源：
Journal of Surface Investigation | 2015年 / 9卷 / 03期
关键词：
microfluidics; plasma; polymethylmethacrylate; reactive ion etching; surface roughness;
D O I：
10.1134/S1027451015030088
中图分类号：
学科分类号：
摘要：
The influence of oxygen-, fluorine-, and argon-containing plasmas on the morphology of the surface of polymethylmethacrylate during reactive ion etching is investigated. A series of experiments on polymer surface etching microns is performed at different gas compositions (O2, N2, Ar, O2/N2, O2/Ar, CF4, and O2/CF4). It is demonstrated that the etching depth and surface roughness of the material increase with increasing RF oscillator power and, moreover, depend considerably on the composition and percentage ratio of gases injected into the chamber. © 2015, Pleiades Publishing, Ltd.
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页码：457 / 461
页数：4
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